Feng-Cheng Hsu, Ph.D.

Post Doctor

Academia Sinica
Institute of Atomic and Molecular Sciences

TEL:  +886-2-23668227
FAX: +886-2-23620200
E-mail: fengcheng.hsu@gmail.com

Curriculum Vitae

EXPERIENCE
Academia Sinica, Taiwan
Post Doctor, Institute of Atomic and Molecular Sciences
since September 2009
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, Taiwan
Principal Engineer, Exploratory Nanopatterning Technology Departement
January 2007 to August 2009
EDUCATION
National Taiwan University, Taiwan
Ph.D., Department of Chemistry, September 1998 to June 2006
B.S., Department of Chemistry, September 1994 to June 1998

 

List of Publications

Journal Articles

1.   F.-C. Hsu, S. H. Lin, and J.-K. Wang, “Direct Observation of Adiabatic cis/trans Photoisomerization Pathway of Long-Chain Stilbenoid: A Global Rearrangement Mechanism”, in preparation.

2.   F.-C. Hsu, M. Hayashi, H.-W. Wang, S. H. Lin, and J.-K. Wang, “Excited-State Dynamics of trans,trans-Distyrylbenzene: Transient Anisotropy and Excitation Energy Dependence”, J. Phys. Chem. A 2007, 111, 759.

3.   F.-C. Hsu, S. H. Lin, and J.-K. Wang, “Excited-State Dynamics of trans,trans-Distyrylbenzene: A Femtosecond Transient Absorption Study”, Chem. Phys. Lett. 2005, 411, 103.

4.   H.-W. Wang, C. Chen, F.-C. Hsu, H.-C. Shieh, J.-K. Wang, S. H. Lin, and M. Hayashi, “Theoretical Studies of Distyrylbenzene and Its Optical Properties”, J. Chin. Chem. Soc. 2005, 52, 665.

5.   S. H. Lin, C.-H. Chang, K. K. Liang, R. Chang, J.-M. Zhang, T.-S. Yang, M. Hayashi, Y.-J. Shiu, and F.-C. Hsu, “Ultrafast Dynamics and Spectroscopy of Bacterial Photosynthetic Reaction”, Adv. Chem. Phys. 2002, 121, 1.

6.   F.-C. Hsu, Y.-T. Kuo, Y.-J. Shiu, K. K. Liang, M. Hayashi, T.-C. Chang, and S. H. Lin, “Theory of Medium-Induced Optical Activities”, J. Chin Chem. Soc. 2001, 48, 631 (Special Issue for 4th Asian International Seminars “Atomic and Molecular Physics” on Oct. 13-18, 2000).

Patents

1.   F.-C. Hsu, J.-H. Chen, “Double Patterning Strategy for Contact Hole and Trench in Photolithography”, US Patent No.: US 2009/0233238 A1 (2009)

2.   F.-C. Hsu, C.-K. Chen, “Double Patterning Strategy for Contact Hole and Trench”, US Patent No.: US 2009/0142701 A1 (2009)