Reactive magnetron sputtering

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¡@Carbon-based nanostructures

 

Amorphous boron carbon nitride films

 

   Deposition condition, composition and mechanical properties of BCN films produced by magnetron sputtering of r.f.-powered h-BN and d.c.-powered graphite targets (sputtering gas, Ar ;0.8 sccm; pressure: 3.5 mTorr)

 

FTIR spectra for a-BxCy N films, deposited at 400 8C, as a function of carbon content

 

Variation of hardness and elasticmodulus of a-BCxNy films, as a function of carbon content, deposited at 75 oC

 

Variation of hardness and elasticmodulus of a-BCxNy films, as a function of deposition temperature

S. C. Chien, S. Chattopadhyay, L. C. Chen, S. T. Lin and K. H. Chen, Diamond & Related Materials, 12, 1463 (2003).